Structural origins of intrinsic stress in amorphous silicon thin films
نویسندگان
چکیده
Eric Johlin,1,* Nouar Tabet,2 Sebastián Castro-Galnares,1 Amir Abdallah,3 Mariana I. Bertoni,1 Tesleem Asafa,2 Jeffrey C. Grossman,1 Syed Said,2 and Tonio Buonassisi1,† 1Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA 2King Fahd University of Petroleum and Minerals, Dhahran 31261, Saudi Arabia 3King Fahd University of Petroleum and Minerals, Center of Research Excellence in Renewable Energy, Dhahran 31261, Saudi Arabia (Received 24 March 2011; revised manuscript received 16 January 2012; published 6 February 2012)
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